发明名称 |
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT |
摘要 |
PROBLEM TO BE SOLVED: To prevent a collector current from changing even at fast operation with a changed collector voltage by making constant a band gap in a first single crystalline semiconductor region in an area near a junction part with a second single crystalline semiconductor region and reduced toward a junction part with a third single crystalline semiconductor region. SOLUTION: A band gap of a first conductivity first single crystalline semiconductor layer which becomes a base region of a bipolar transistor is smaller than the band gap of second conductivity second and third single crystalline semiconductor layers consisting of an emitter region and a collector region. The band gap of a first single crystalline semiconductor layer a base region is fixed in an area near a junction with a second single crystalline semiconductor layer of an emitter region, and reduces toward a junction with a third single crystalline semiconductor layer of a collector region. The thickness of a base layer is about 5 to 100 nm, the thickness of an emitter layer is about 10 to 200 nm and the thickness of a collector layer is about 0.1 nm to 1 μm. |
申请公布号 |
JP2001068480(A) |
申请公布日期 |
2001.03.16 |
申请号 |
JP20000182300 |
申请日期 |
2000.06.13 |
申请人 |
HITACHI LTD;HITACHI DEVICE ENG CO LTD |
发明人 |
WASHIO KATSUYOSHI;HAYAMIZU REIKO;SHIMAMOTO HIROMI;KONDO MASAO;ODA KATSUYA;OUE EIJI;TANABE MASAMICHI |
分类号 |
H01L29/73;H01L21/331;H01L21/8222;H01L27/082;H01L29/732;H01L29/737;H03F3/08;H03F3/45 |
主分类号 |
H01L29/73 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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