发明名称 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To prevent a collector current from changing even at fast operation with a changed collector voltage by making constant a band gap in a first single crystalline semiconductor region in an area near a junction part with a second single crystalline semiconductor region and reduced toward a junction part with a third single crystalline semiconductor region. SOLUTION: A band gap of a first conductivity first single crystalline semiconductor layer which becomes a base region of a bipolar transistor is smaller than the band gap of second conductivity second and third single crystalline semiconductor layers consisting of an emitter region and a collector region. The band gap of a first single crystalline semiconductor layer a base region is fixed in an area near a junction with a second single crystalline semiconductor layer of an emitter region, and reduces toward a junction with a third single crystalline semiconductor layer of a collector region. The thickness of a base layer is about 5 to 100 nm, the thickness of an emitter layer is about 10 to 200 nm and the thickness of a collector layer is about 0.1 nm to 1 μm.
申请公布号 JP2001068480(A) 申请公布日期 2001.03.16
申请号 JP20000182300 申请日期 2000.06.13
申请人 HITACHI LTD;HITACHI DEVICE ENG CO LTD 发明人 WASHIO KATSUYOSHI;HAYAMIZU REIKO;SHIMAMOTO HIROMI;KONDO MASAO;ODA KATSUYA;OUE EIJI;TANABE MASAMICHI
分类号 H01L29/73;H01L21/331;H01L21/8222;H01L27/082;H01L29/732;H01L29/737;H03F3/08;H03F3/45 主分类号 H01L29/73
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