| 摘要 |
PROBLEM TO BE SOLVED: To finely and stably detect the end point by adding an electric end point detecting function to a plasma etching system having a function of optically detecting the end point. SOLUTION: A high frequency sensor 14 reads the high frequency power of a plasma etching system, an AD converter 19 in a computer converts into digital signals, a max. value, a min. value and a mean value are obtained by software, and the end point is detected by comparison with a preset slope. An end point detect signal is sent to a controller 31 of the plasma etching system to proceed with the process, acquired data are stored in a memory and can be reproduced whenever required.
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