| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a member which prevents dust from sticking on a mask and, as a result, restrains generation of defects on a pattern which is formed on a board by using mask exposure, and to provide an electron beam projection aligner provided with the member. SOLUTION: This protective member for an electron beam transfer mask is provided with a membrane 1 having electron beam transparency on which fine penetrating holes 3 are formed, and an outer peripheral frame 2 fixing the outer periphery of the membrane and retaining it. Film thickness of the membrane is about 10-150 nm, and the diameter of the penetrating hole formed on the membrane is about 10-100 nm.</p> |
