发明名称 BEAM HOMOGENIZER, METHOD AND DEVICE FOR LASER PROJECTION, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently disperse the distribution of an interference peak by projecting a standing wave on the surface of an object, for diagonal scanning to the width wise direction of linear beam. SOLUTION: The distribution of interference fringe in a linear laser beam can be shaped into a sine wave form for effective function if the number of lenses constituting a cylindrical lenses 202 is odd. The uneven energy, however, still exists due to optical interference in the linear laser beam. The uneveness can be exaggerated depending on the irradiation condition of laser beam. In this case, the scanning direction of the laser beam may be fine tuned for improvement. Fine tuning is performed by allowing the linear laser beam to scan in the direction deflected, while orthogonal to the line direction of the beam, by an angle (y) from the direction, in a plane, containing the plane formed by the linear laser beam, for laser process.
申请公布号 JP2001068430(A) 申请公布日期 2001.03.16
申请号 JP20000228806 申请日期 2000.07.28
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 TANAKA KOICHIRO
分类号 H01L21/20;H01L21/268;(IPC1-7):H01L21/268 主分类号 H01L21/20
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