ELECTROSTATIC CHUCK OF APPARATUS FOR ETCHING SEMICONDUCTOR

摘要

PURPOSE: An electrostatic chuck of an apparatus for etching a semiconductor is provided to prevent a manufacturing process from being delayed by an error of an equipment, by preventing cooling gas from over-leaking by a foreign substance when the foreign substance is generated on a lower surface of a wafer. CONSTITUTION: A plurality of elevating pins(12) are installed to be elevated in a body(11). A plurality of gas supplying holes(13) are installed in the periphery of the elevating pins. Ring-type supporting projections(14) having different sizes and a constant height are projected on an upper surface of the body so that a wafer is separated on the upper surface of the body.