发明名称 DEVICE FOR INSPECTING FOREIGN MATTER AND FAULT
摘要 PURPOSE: A device is provided to quickly investigate the causes of abnormality by measuring information on size of the detected object at real time and controlling only the detected object of specific size using the information on size. CONSTITUTION: First, a light from an illumination source(201) is given to an object(202) to be inspected, a scattering light from the object(202) to be inspected is condensed by a condensing lens(203), and a reflection light from the object(202) to be inspected is detected by a detetcor(204). The reflection light detected by the detector(204) is subjected to photoelectric conversion, and it is processed by a signal processing circuit(205) to detect a foreign matter. Further, the object(202) to be inspected is moved by a stage(207), so that a foreign matter can be detected in the entire area of the object(202) and a detection result be also indicated in a data indication part(206). Thus, a status relating to the size and generation cause of the foreign matter having a specific size is controlled, thereby finding out the cause of generation of the foreign matter quickly in a manufacturing device.
申请公布号 KR20010021381(A) 申请公布日期 2001.03.15
申请号 KR20000048846 申请日期 2000.08.23
申请人 HITACHI ELECTRONICS ENGINEERING CO., LTD.;HITACHI.LTD. 发明人 NISHIYAMA HIDETOSHI;NOGUCHI MINORU;OSHIMA YOSHIMASA;WATANABE TETSUYA;NAKAMURA HISATO;JINGU TAKAHIRO;INOUE HIROKO;SAIKI GEIKI;WATANABE GENJI
分类号 G01N21/898;(IPC1-7):H01L21/66 主分类号 G01N21/898
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