发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE THEREOF, AND GYROSCOPE
摘要 PURPOSE: A method for manufacturing a semiconductor device, a semiconductor device thereof, and a gyroscope are provided to form easily an electrode on an upper face of a fine projection portion. CONSTITUTION: A semiconductor member having a projection region(102) on a substrate(100) is prepared. An upper face of the substrate(100), an upper face(101) of the projection region(102), a side face of the projection region(102) is buried by performing a spin-coating process using a potting material(104). The upper face(101) of the projection region(102) is exposed. An electrode material is coated on the upper face(101) of the projection region(102). The potting material(104) is removed.
申请公布号 KR20010020861(A) 申请公布日期 2001.03.15
申请号 KR20000026997 申请日期 2000.05.19
申请人 CANON KABUSHIKI KAISHA 发明人 NAKANISHI KOICHIRO;NUMAI TAKAHIRO
分类号 H01S5/30;G01C19/66;H01L21/00;H01S5/00;H01S5/042;H01S5/10;H01S5/183;H01S5/20;H01S5/22;H01S5/227;H01S5/343;(IPC1-7):H01S5/30 主分类号 H01S5/30
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