发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE THEREOF, AND GYROSCOPE |
摘要 |
PURPOSE: A method for manufacturing a semiconductor device, a semiconductor device thereof, and a gyroscope are provided to form easily an electrode on an upper face of a fine projection portion. CONSTITUTION: A semiconductor member having a projection region(102) on a substrate(100) is prepared. An upper face of the substrate(100), an upper face(101) of the projection region(102), a side face of the projection region(102) is buried by performing a spin-coating process using a potting material(104). The upper face(101) of the projection region(102) is exposed. An electrode material is coated on the upper face(101) of the projection region(102). The potting material(104) is removed.
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申请公布号 |
KR20010020861(A) |
申请公布日期 |
2001.03.15 |
申请号 |
KR20000026997 |
申请日期 |
2000.05.19 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
NAKANISHI KOICHIRO;NUMAI TAKAHIRO |
分类号 |
H01S5/30;G01C19/66;H01L21/00;H01S5/00;H01S5/042;H01S5/10;H01S5/183;H01S5/20;H01S5/22;H01S5/227;H01S5/343;(IPC1-7):H01S5/30 |
主分类号 |
H01S5/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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