发明名称 DC POWERED CONTINUOUS PLASMA POLYMERIZATION APPARATUS
摘要 PURPOSE: A DC powered continuous plasma polymerization apparatus is provided to produce a high quality deposited film by discharging only at an opposite electrode area not sealing between a transfer chamber and a deposition chamber, and improve productivity of products by plasma polymerizing both sides of a substrate at one time in the same conditions. CONSTITUTION: A DC powered continuous plasma polymerization apparatus consists a transfer chamber in which an unwinding roll (11) transferring to other chamber by unwinding a substrate (1) to be surface treated and a winding roll (12) winding the surface treated substrate are contained, a deposition chamber (20) in which both sides of the substrate (1) are plasma polymerized by DC discharging plasma by using the substrate (1) introduced from the unwinding roll (11) of the transfer chamber as an anode electrode and installing a separate cathode electrode which is opposite to upper and lower of the substrate (1), a high voltage supplier impressing a high voltage to the substrate (1), a pumping device for maintaining the deposition chamber (20) in vacuum, and a gas inlet part introducing a reactive gas and a non reactive gas.
申请公布号 KR20010018714(A) 申请公布日期 2001.03.15
申请号 KR19990034781 申请日期 1999.08.21
申请人 LG ELECTRONICS INC. 发明人 JUNG, YEONG MAN;LEE, SU WON;YOON, DONG SIK
分类号 B01J19/08;B05D7/14;B05D7/24;C23C16/503;C23C16/54;(IPC1-7):C23C16/54 主分类号 B01J19/08
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