发明名称 Device for off-line determination of projection geometries of X=ray system
摘要 The device includes two regions surrounding an axis (A), the regions being axially offset and provided with X-ray positive marks. The marks (6) of the first region (1) are arranged close to the axis, and the marks (4) of the second region (2) are arranged at a larger distance from the axis than the marks of the first region. A third region may be provided with X-ray positive marks (5) which are at a larger distance from the axis than the marks of the first region, the first region lying between the second and the third region.
申请公布号 DE19936409(A1) 申请公布日期 2001.03.15
申请号 DE19991036409 申请日期 1999.08.03
申请人 SIEMENS AG 发明人 MITSCHKE, MATTHIAS
分类号 A61B6/00;G01N23/06;(IPC1-7):G01N23/06;A61B6/03;G03B42/02 主分类号 A61B6/00
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