发明名称 MULTILAYER FILM REFLECTING MIRROR AND EXPOSURE DEVICE OR ANALYZER
摘要 PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror having high reflectivity and low wavelength resolution particularly for a wavelength near 60Åin a soft X-ray region. SOLUTION: The multilayer film reflecting mirror comprises first layers 3 each made of a substance having a small difference between a refractive index in a soft X-ray region and a vacuum refractive index, and second layers 2 each made of a substance having a large difference between the index in the soft X-ray region and the vacuum index. The layers 3 and 2 are alternately laminated on a base plate 1 to form a multilayer film, as the substance having the large difference in refractive indexes, a substance having at least a copper, nickel, cobalt, manganese and chromium is used, and as the substance having the small difference, a substance having at least a carbon is used.
申请公布号 JP2001066399(A) 申请公布日期 2001.03.16
申请号 JP19990241512 申请日期 1999.08.27
申请人 NIKON CORP 发明人 ISHIYAMA WAKANA
分类号 G21K1/06;(IPC1-7):G21K1/06 主分类号 G21K1/06
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