SYSTEM FOR DEPOSITING THIN FILM

摘要

PURPOSE: A system for depositing a thin film is provided to form a pure thin film desired in a production line regardless of a processing order of respective wafers, by connecting a thin film deposition chamber and a process gas supplying parts with a plurality of process gas supplying pipes. CONSTITUTION: A thin film deposition chamber(10) forms a thin film in a specific layer of a wafer(1). A plurality of process gas supplying parts(20,30) supply predetermined process gas to the thin film deposition chamber. A plurality of process gas supplying pipes(21,31) connect the thin film deposition chamber with the respective process gas supplying parts by one-to-one correspondence.