发明名称 APPARATUS FOR FIXING QUARTZ CAP OF VERTICAL DIFFUSION FURNACE FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PURPOSE: An apparatus for fixing a quartz cap of a vertical diffusion furnace for manufacturing a semiconductor device is provided to extend a lifetime of a quartz cap and to stably maintain an align state of a wafer, by compensating for an etch phenomenon of a pin insertion part to be equipped with a reusable spare insertion part. CONSTITUTION: The first and second pin inserting holes(42b,42c) have different dimensions, installed on a main part of a quartz cap(40) to change an insertion position of a boat connecting pin(8) after a predetermined interval of time elapses, considering an etching phenomenon by a chemical cleaning liquid. The first and second pin hitching grooves(44a,44b) have different dimensions, installed in a flange part(44) to change an insertion position of a base material(6).
申请公布号 KR20010019990(A) 申请公布日期 2001.03.15
申请号 KR19990036672 申请日期 1999.08.31
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, DONG UK;KIM, SANG UN;KWON, JEONG HWAN
分类号 H01L21/22;(IPC1-7):H01L21/22 主分类号 H01L21/22
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