发明名称 PASSIVATION OF MATERIAL USING ULTRA-FAST PULSED LASER
摘要 <p>The surface of a semiconductor material, e.g., gallium arsenide, is passivated by irradiating the surface with ultra-short laser pulses, until a stable passive surface is achieved. The passive surface so prepared is devoid of a superficial oxide layer.</p>
申请公布号 WO2001018852(A1) 申请公布日期 2001.03.15
申请号 US2000024837 申请日期 2000.09.11
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