| 摘要 |
PURPOSE: A method for stably depositing a release agent such as metal, phosphorous material and oxide film on an object by use of a sputtering apparatus is provided, which generates no separation, provides a uniform deposition degree and can express peculiar colors of a release agent. CONSTITUTION: The process for deposition of a release agent comprises removing oxygen, nitrogen, hydrogen or the like contained in an object by heating at about 150 deg.C for several minutes, introducing the object into a chamber, pouring inactive gas such as argon gas therein, dissociating the inactive gas into a cation and an anion by the potential difference of a positive part and a negative part and evaporating an atom or a molecular of a release agent of the negative part with the dissociated cation.
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