发明名称 |
METHOD FOR MANUFACTURING CAPACITOR |
摘要 |
PURPOSE: A method for manufacturing a capacitor is provided to increase an effective surface area of the capacitor, by having a storage electrode of the capacitor have a wrinkled shape, thereby by increasing capacitance. CONSTITUTION: A multilayered insulating layer(218) is formed on an insulating layer(210) having a contact plug(214) by alternatively and repeatedly depositing insulating layers(218a-218g) having different wet-etch selectivity. The multilayered insulating layer is etched to form an opening(220) by a photo process. The inside wall of the opening is further etched to have a wrinkled shape. The thickness of the multilayered insulating layer is from 3000 to 20000 angstrom.
|
申请公布号 |
KR20010019176(A) |
申请公布日期 |
2001.03.15 |
申请号 |
KR19990035458 |
申请日期 |
1999.08.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, JE MIN |
分类号 |
H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|