发明名称 METHOD FOR MANUFACTURING CAPACITOR
摘要 PURPOSE: A method for manufacturing a capacitor is provided to increase an effective surface area of the capacitor, by having a storage electrode of the capacitor have a wrinkled shape, thereby by increasing capacitance. CONSTITUTION: A multilayered insulating layer(218) is formed on an insulating layer(210) having a contact plug(214) by alternatively and repeatedly depositing insulating layers(218a-218g) having different wet-etch selectivity. The multilayered insulating layer is etched to form an opening(220) by a photo process. The inside wall of the opening is further etched to have a wrinkled shape. The thickness of the multilayered insulating layer is from 3000 to 20000 angstrom.
申请公布号 KR20010019176(A) 申请公布日期 2001.03.15
申请号 KR19990035458 申请日期 1999.08.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, JE MIN
分类号 H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L27/108
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