MAGNETIC ENHANCED REACTIVE ION ETCHING APPARATUS

摘要

PURPOSE: A magnetic enhanced reactive ion etching(MERIE) apparatus is provided to maximize space efficiency, by changing spatial disposition of magnets installed in an etching reaction chamber. CONSTITUTION: An etching reaction chamber(20) is of a pillar shape. A wafer holder(34) is included in the etching reaction chamber for supporting the processed, functioning as a lower electrode. An upper electrode(42') is installed in an upper portion of the etching reaction chamber. A magnet is installed near the reaction chamber. A reaction gas inducing unit(44) induces reaction gas to the reaction chamber. A reaction gas exhausting unit(40) exhausts the reaction gas out of the reaction chamber.