发明名称 |
A radiation-sensitive composition, used to produce printing plates, printed circuit boards for integrated circuits and photomasks |
摘要 |
A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising 3 specified units which are responsible for alkali-solubility, high Tg and water-solubility respectively. A radiation-sensitive composition comprises (a) a naphthoquinone diazide derivative(s); (b) a novolac(s); and (c) a copolymer comprising the following units: (A) 5-50 mol% unit of formula (I); (B) 20-70 mol% unit of formula (II); and (C) 10-50 mol% unit of formula (III), where (C) is different from (A). R<1>, R<4> = group selected so that the homopolymer of (I) is alkali-soluble; R<2>, R<6>, R<7> = group selected so that the homopolymer of (II) has a high Tg; and R<3>, R<5> = group selected so that the homopolymer of (III) is water-soluble. Also claimed are (1) preparation of the above radiation-sensitive composition comprising mixing components (a)-(c) and dissolving the solids components in an organic solvent; (2) preparation of the above radiation-sensitive composition comprising dissolving the individual components (a)-(c) separately in an organic solvent and then mixing the solutions; (3) a printing plate comprising a substrate and the above radiation-sensitive composition; and (4) preparation of the printing plate comprising applying a solution of the above radiation-sensitive composition in an organic solvent to a substrate which has optionally been pre-treated, followed by drying.
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申请公布号 |
DE19936332(A1) |
申请公布日期 |
2001.03.15 |
申请号 |
DE19991036332 |
申请日期 |
1999.08.02 |
申请人 |
KODAK POLYCHROME GRAPHICS GMBH |
发明人 |
JAREK, MATHIAS;HAUCK, GERHARD |
分类号 |
G03F7/023;(IPC1-7):G03F7/038;B41N1/00;G03F7/008 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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