SCRUBBER DEVICE

摘要

PURPOSE: A scrubber device is provided to clean a front face part of a wafer at the same time etching a rear face part of the wafer by supplying the front face part of the wafer with a non-etching fluid whenever supplying the rear face part of the wafer with an etching fluid. CONSTITUTION: A wafer support unit(15) supports a wafer(W). A scrubber brush(13b) is in contact with a front face part of the wafer(W). An etching fluid supply unit(25a) supplies a rear face part of the wafer(W) with an etching fluid. A non-etching fluid supply unit(25b) supplies the front face part of the wafer(W) with a non-etching fluid. A controller(27) commands that the non-etching fluid supply unit(25b) supplies the front face part of the wafer(W) with the non-etching fluid whenever the etching fluid supply unit(25a) supplies the rear face part of the wafer(W) with the etching fluid.