INNER-ELECTRODE PLASMA PROCESSING APPARATUS AND METHOD OF PLASMA PROCESSING

摘要

In an inner-electrode plasma processing apparatus, an induction-coupled electrode (12) facing to a wafer (17) has a shape such that a conductor is folded at its central part. Plasma discharge occurs around the electrode (12) when a high-frequency is fed between the ends of the electrode (12) so that a standing wave of a half wavelength is established forming an antinode in each linear part of the folded electrode (12). The antinode of the standing wave in each linear part of the electrode is actively generated and controlled to effectively utilize it. The frequency f of the high frequency is given by f=(c/ 2ROOT epsilon p)/2L1, where c is the speed of light, L1 is the length of the linear parts, and epsilon p is the relative permittivity of the plasma. The electrode is thus constituted in consideration plasma parameters around the electrode by actively utilizing the standing wave, properly controlling the density distribution of the plasma.