发明名称 DRYER AND DRYING METHOD
摘要 PURPOSE: Disclosed is a dryer in which particles can be removed surely from the surface of a matter to be dried without causing any stain (water mark) thereon. CONSTITUTION: The dryer(1) comprises a drying tank(7), a processing liquid supply section(6), a vapor supply section(18), and first and second inert gas supply units(2,42). The drying tank(7) contains a wafer(3) and the processing liquid supply section(6) supplies pure water thereto. The vapor supply section(18) comprises an organic solvent heating tank(19) and a slit(21). The organic solvent heating tank(19) comprises an inner tank(22) and an outer tank(23). The inner tank(22) contains an organic solvent and an outer tank(23) is supplied with heating liquid. The organic solvent is heated to produce vapor. The slit(21) interconnects the drying tank(7) and the organic solvent heating tank(19). The first inert gas supply unit(2) supplies inert gas from the upper part of the drying tank(7) and the second inert gas supply unit(42) supplies inert gas to the organic solvent contained in the inner tank(22).
申请公布号 KR20010020674(A) 申请公布日期 2001.03.15
申请号 KR20000014773 申请日期 2000.03.23
申请人 KIMMON QUARTZ CO., LTD. 发明人 OMEGA SEMICON DENSHI KK;WATANABE KAZUTOSHI;TAKAHASHI HIROKI
分类号 H01L21/304;F26B21/04;H01L21/00;(IPC1-7):H01L21/304 主分类号 H01L21/304
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