APPARATUS FOR SUPPLYING REACTION GAS IN SEMICONDUCTOR PROCESS CHAMBER

摘要

PURPOSE: An apparatus for supplying reaction gas in a semiconductor process chamber is provided to increase surface uniformity of a wafer, by uniformly supplying the reaction gas to the surface of the wafer so that the reaction gas deposited on the wafer can be uniformly distributed. CONSTITUTION: A susceptor(40) is installed to be capable of elevating so that a wafer(50) can be settled in an inner center of a process chamber(20). A plurality of gas inducing pipes(62,64) are vertically installed on a circumference of the susceptor to induce reaction gas into the chamber. A gas circulation pipe(66) of a ring type is horizontally coupled to the respective portions of the gas inducing pipes to uniformly supply the reaction gas to the surface of the wafer. A gas exhaust pipe(14) is installed downward in a side of the process chamber to exhaust gas after reaction.