| 摘要 |
PURPOSE: A method for fabricating a micro-structure is provided which is capable of adjusting thermal expansion coefficient of the micro-structure to easily attach the micro-structure to a substrate having inherent thermal expansion coefficient. CONSTITUTION: A mask pattern is formed on a photosensitive substrate. The photosensitive substrate is exposed. The mask pattern is eliminated, and the photosensitive substrate is heat-treated at a predetermined temperature to transform an unexposed portion of the substrate into amorphous structure having lots of defects. The unexposed portion is etched to be removed, to thereby form a micro-structure. An additional heat treatment is carried out for the photosensitive substrate on which the micro-structure is formed to adjust thermal expansion coefficient of the photosensitive substrate.
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