发明名称 Method and apparatus for exposing a photosensitive material
摘要 <p>The invention relates to a method and apparatus for exposing a photosensitive material such as colour negative film, colour reversal film and colour photographic paper, for evaluating the photographic characteristics of said photosensitive material. At least two different areas of the material are exposed differently and at least one light beam is used. At least one light beam is split into at least first and second parts which are equal to each other. At least two different areas are respectively exposed to the first part of the said light beam and the second part of the said light beam.</p>
申请公布号 EP1083460(A1) 申请公布日期 2001.03.14
申请号 EP19990202942 申请日期 1999.09.09
申请人 FUJI PHOTO FILM B.V. 发明人 PALMIUS, KJELL;HUMMELINK, JANNIEK
分类号 G03C5/02;G03C5/04;G03C7/18;(IPC1-7):G03C5/02 主分类号 G03C5/02
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