Patterning method and semiconductor device

摘要

A method useful in a radiation-sensitive-material exposure system (100) having a radiation source (106), a phase-shifting mask (103) and a focal plane. Radiation is transmitted from the source through the phase-shifting mask onto a radiation-sensitive-material (101). The spatial relationship between the focal plane and the radiation-sensitive-material is adjusted and radiation is transmitted from the source through the phase-shifting mask onto a radiation-sensitive-material after again. The technique may be repeated at any number of focal plane positions to improve simultaneously the imaging process resolution and depth of focus.