发明名称 METHOD OF FORMING FLUORESCENT FILM PATTERN
摘要 PURPOSE: A method of forming a fluorescent film pattern is provided to solve a problem that a fluorescent film is misprinted due to mis-alignment of screen masks having different exposure patterns. CONSTITUTION: A fluorescent film(118) is formed on a glass substrate(110) on which barrier ribs(111,115) of an image display part of a display are exposed, having a distance. The fluorescent film is divided into a remaining region and a removal region, and a photosensitive material layer(122) is selective formed on the remaining region. The photosensitive material layer is exposed. The fluorescent film on the glass substrate corresponding to the remaining region is left using the exposed photosensitive material layer as a development mask, and the fluorescent film on the glass substrate corresponding to the removal region is eliminated to expose the substrate, thereby forming a fluorescent film pattern.
申请公布号 KR20010019427(A) 申请公布日期 2001.03.15
申请号 KR19990035825 申请日期 1999.08.27
申请人 SAMSUNG SDI CO., LTD. 发明人 SHIN, GYU SIK
分类号 H01J11/42;(IPC1-7):H01J17/49 主分类号 H01J11/42
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