发明名称 |
Method of purifying photoacid generators for use in photoresist compositions |
摘要 |
The present invention is directed to a process of removing trace acidic impurities from an impure solution of photoacid generating compounds in a solvent, comprising contacting an impure solution of at least one photoacid generating compound containing trace amounts of acidic impurities with an amine-containing ion exchange resin for a sufficient amount of time to remove substantially all of the acidic impurities from the impure solution, thereby producing a pure solution of at least one photoacid generating compounds substantially free of trace acidic impurities. The invention is also directed to a solution of at least one photoacid generating compound substantially free of trace acidic impurities made by the above process.
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申请公布号 |
US6200480(B1) |
申请公布日期 |
2001.03.13 |
申请号 |
US19980006409 |
申请日期 |
1998.01.13 |
申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
FERREIRA LAWRENCE;MALIK SANJAY |
分类号 |
B01D15/04;B01J41/04;B01J45/00;G03F7/004;(IPC1-7):B01D15/04 |
主分类号 |
B01D15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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