发明名称 ANTIPRURITIC SKIN LINIMENT
摘要 PROBLEM TO BE SOLVED: To obtain an antipuritic skin liniment containing an antipruritic and excellent in itch-mitigating effect and its sustaining effect. SOLUTION: This antipruritic skin liniment is obtained by formulating a base with a capsaicin analogue and at least one kind of coating agent selected from the group consisting of (1) clay minerals, (2) pigments, (3) metallic soaps, (4) polymeric compounds, (5) mutually coated products of the ingredients 1 and/or 2, (6) baked products of the respective ingredients 1 and 2, (7) particulate products afforded from the respective ingredients 1 to 6, and (8) coated products obtained by coating the ingredients 1 to 6 with a silicone, surfactant or polymeric compound, respectively.
申请公布号 JP2001064164(A) 申请公布日期 2001.03.13
申请号 JP20000188761 申请日期 2000.06.23
申请人 HEALTH SCIENCE CENTER:KK 发明人 TANAKA NORIMASA;ISHIHARA YUKIKO
分类号 A61K9/06;A61K31/165;A61K47/02;A61K47/04;A61K47/12;A61K47/30;A61P17/04;(IPC1-7):A61K31/165 主分类号 A61K9/06
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