发明名称 |
Method for isolation of optical defect images |
摘要 |
A method of manufacturing semiconductor devices wherein defect images are isolated from reference images in an optical tool. Each layer of a semiconductor are inspected for defects and identified defect images are subtracted from reference images providing an operator of the optical tool a resultant image of the defects or a highlighted image of the defect.
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申请公布号 |
US6200823(B1) |
申请公布日期 |
2001.03.13 |
申请号 |
US19990247241 |
申请日期 |
1999.02.09 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
STEFFAN PAUL J.;YU ALLEN S. |
分类号 |
G09G3/00;H01L21/66;(IPC1-7):G01R31/26 |
主分类号 |
G09G3/00 |
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