| 摘要 |
A developing apparatus includes: a developing sleeve that carries a mono-component developer; and a developing blade that abuts on the sleeve to regulate a layer thickness of the developer on the sleeve, wherein surface roughness parameters of the sleeve satisfy: 3.0<=Rpk<=9.0; and 2<=Pc2<=10. At an abutment portion between the sleeve and the blade, surface roughness parameters of the blade satisfy: 0.030<=Sm<=0.170; and 0.10<=Rvkx(100-Mr2)/100<=1.30, where Sm is a mean spacing of profile irregularities [mm]; Rpk is an initial wear height [mum]; Rvk is an oil retaining depth [mum]; Mr2 is a profile bearing length ratio 2 [%]; and Pc2 denotes the number of profile peaks having a height larger than a count level from a center line per the evaluation length of 1 mm.
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