发明名称 POLISHING CLOTH AND SURFACE POLISHING WORK METHOD
摘要 PROBLEM TO BE SOLVED: To provide a polishing cloth and a surface polishing work method so improved that a characteristic thereof can be effectively displayed by attaining improvement of polishing work performance and polishing accuracy relating to a workpiece particularly by using through combination with a colloid- state polishing fluid. SOLUTION: This polishing cloth is applied for a surface polishing device or the like by coating an inner surface of a pair of upper/lower rotary level blocks 1, 2 with a polishing cloth 5 to interpose a workpiece 4 from upward/ downward and supplying a polishing fluid 6 dropped between the workpiece and the polishing cloth to perform polishing work of the workpiece. In the polishing cloth, consisting of a sheet-state surface layer 5b made by a base layer 5a and a soft plastic foam layered on the base layer, the surface layer 5a is formed by a closed cell foam coating its surface with a skin layer of non-foaming and wrapping a cell (bubble) in the layer without opening to the surface, and surface polishing work of the workpiece is performed by combination with a colloid-state polishing fluid with colloidal serving as an abrasive grain as the polishing fluid.
申请公布号 JP2001062704(A) 申请公布日期 2001.03.13
申请号 JP19990243620 申请日期 1999.08.30
申请人 FUJI ELECTRIC CO LTD 发明人 ICHINO MITSUYOSHI;NAKAMURA KOJI;ISHIZAWA YOSHIAKI;ITO TAIJI;SHIMOBAYASHI TAKAHIRO;IKEMORI GOSUKE;FUJISAWA YUICHIRO
分类号 B24B29/00;B24B37/20;B24B37/22;B24B37/24;B24D13/14;G11B5/84 主分类号 B24B29/00
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