发明名称 Apparatus and method for inline removal of impurities from wet chemicals
摘要 An apparatus and method for purifying semiconductor silicon wafer processing chemicals in line, the apparatus comprising a non-reactive chemical support, and a crown ether polymer covalently bonded to said non-reactive support, is disclosed. In operation, the crown ether polymer contained within the housing is positioned in-line with a wet chemical recirculation line, transfill system or distribution system.
申请公布号 US6200478(B1) 申请公布日期 2001.03.13
申请号 US19990416484 申请日期 1999.10.12
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 CHORUSH RUSSELL A.;HOGAN JEREMIAH D.
分类号 B01D15/04;(IPC1-7):B01D15/04 主分类号 B01D15/04
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