| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive resin which is halogen-free and, in addition, can impart properties such as high flame retardance, excellent heat resistance, moisture, resistance, mechanical properties, and developability to the cured products, and a resist ink composition using the same. SOLUTION: This photosensitive resin is an acid addition vinyl ester resin obtained by adding an ethylenically unsaturated monobasic acid to an epoxy resin, and then, reacting the resulting adduct with a polybasic acid anhydride, and at least a part of the polybasic acid anhydride is a phosphorus-containing compound represented by the formula (wherein R1 and R2 are the same or different and each an aliphatic group or an aromatic group; R3 is a hydrogen atom or a 1-3C alkyl group; (n) and (m) are each an integer of 0-4; and (q) is an integer of 0-3). A photocurable or thermosetting resist ink composition developable with an alkali solution comprises (A) the photosensitive resin, (B) a diluent, (C) a photopolymerization initiator, and (D) a thermosetting component composed of an epoxy compound having two or more epoxy groups per molecule. |
