| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer highly transparent to short-wavelength lasers such as ArF excimer lasers, excellent in dry etching resistance and adhesion to a substrate, and useful as a resist polymer by using a polymerizable compound having a norbornane lactone structure. SOLUTION: The polymerizable compound is represented by the formula (wherein one of R1 and R2 is a 1-4C alkyl except t-butyl, the other is hydrogen or a 1-4C alkyl except t-butyl; R3 to R9 are each independently hydrogen, silyl, cyano, hydroxyl, a halogen, or a monovalent non-polymerizable organic substituent; and A is a group having a polymerizable carbon-to-carbon double bond, provided that, although not particularly limited, A is desirably acyloyl, methacryloyl, or a group having a norbornene residue). The compound is converted into a polymer by homopolymerization or copolymerization with a copolymerizable compound. |
