| 摘要 |
Methods are disclosed for making reticles for charged-particle-beam (CPB) microlithography and for using such reticle for making CPB microlithographic exposures using divided-pattern exposure. The reticles are made using data, generated from corresponding LSI design data by a "data generator" (e.g., computer), and stored as a reticle-pattern data file in a memory. Corresponding data for controlling a CPB microlithographic exposure apparatus (using the reticle) are stored in an exposure data file. Of the data stored in these files, the reticle-pattern data is routed to a host computer for a reticle-writing device. The reticle writing device produces a pattern on a segmented reticle according to the data. Exposure data corresponding to the reticle-pattern data are routed to a host computer of a CPB microlithographic exposure apparatus. The host computer of the CPB exposure apparatus utilizes the data to drive the CPB exposure apparatus to perform transfer of the pattern from the reticle to the substrate.
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