| 摘要 |
<p>A device and a method for a photo are provided to convey a substrate to a coating line, an exposing line and a developing line through a retransfer line to reduce an entire layout of a photo process line. A substrate is loaded and unloaded by a loading/unloading part(300). A photoresist is coated on the substrate through a coating line(500). The coated photoresist is exposed on the substrate through an exposing line(700). The exposed substrate is developed at a developing line(900). A retransfer line(600) stores the substrate temporarily, and retransfers that to the exposing line or the developing line.</p> |
