发明名称 Thinning semiconductor wafers with contacts, involves forming protective resin reinforcing layer on component side, then polishing and thinning at rear
摘要 A protective resin layer (3) is formed on the face of a semiconductor wafer (1), which has semiconductor elements (2) mounted upon it. The rear surface of the wafer is polished and thinned, following the treatment to form the resin layer. An Independent claim is included for a device as formed above, in which the semiconductor wafer thickness is <= 300 mu m.
申请公布号 FR2798223(A1) 申请公布日期 2001.03.09
申请号 FR20000011202 申请日期 2000.09.01
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO LTD 发明人 HAJI HIROSHI;SAKEMI SHOJI
分类号 H01L21/56;H01L21/60;H01L21/68;H01L23/31;H01L23/485 主分类号 H01L21/56
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