发明名称 CAPACITOR STRUCTURE
摘要 The invention relates to a capacitor structure, comprising a capacitor region, a border region and optionally comprising a contact region. Said capacitor region has a first conductive layer (1), a continuous first insulation layer which is applied to the first conductive layer and a continuous second conductive layer (6) which is applied to the insulation layer (5). In addition, elongated recesses are incorporated into the capacitor region. The capacitor structure is characterised in that the second insulation layer (7) is located either between the first electrically conductive layer and the first insulation layer, or between the first electrically conductive layer and the second electrically conductive layer.
申请公布号 WO0117032(A1) 申请公布日期 2001.03.08
申请号 WO2000EP08307 申请日期 2000.08.25
申请人 INFINEON TECHNOLOGIES AG;LOSEHAND, REINHARD;WERTHMANN, HUBERT 发明人 LOSEHAND, REINHARD;WERTHMANN, HUBERT
分类号 H01L29/94 主分类号 H01L29/94
代理机构 代理人
主权项
地址