发明名称 UV radiation system having materials for selectively attenuating radiation
摘要 This invention provides a high energy radiation system which produces UV radiation comprising a selectively attenuating material which increases the ratio of desired to undesired radiation to reduce the radiation damage to a target by selectively attenuating at least 30 percent of the radiation from greater than 200 up to 240nm which impinges upon said attenuating material, and directs greater than 50 percent of the radiation from 240nm to 280nm which impinges upon said attenuating material.
申请公布号 AU4718200(A) 申请公布日期 2001.03.08
申请号 AU20000047182 申请日期 2000.07.12
申请人 JOHNSON & JOHNSON VISION CARE, INC. 发明人 ALLAN W. KIMBLE;JOHN B. ENNS;JAMES A. EBEL
分类号 G21K5/00;A61L2/10;A61L12/06;B65B25/00;G02B5/20 主分类号 G21K5/00
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