发明名称 DRAM with impurity region of second conductivity
摘要 A semiconductor substrate (1) of a second conductivity has an impurity region of first conductivity on its main surface. On the latter is deposited an insulating layer with an aperture region, reaching up to the impurity region. On the latter and in contact with it is a first electrode layer, extending to the insulating layer surface. The contacting is carried out via a first region (11a) while a second region of the electrode layer extends vertically upwards w.r.t. the substrate main surface and along the first region outer edge. The electrode layer surface is coated by a dielectric layer (12), covered by a second electrode layer (13).
申请公布号 DE4143476(C2) 申请公布日期 2001.03.08
申请号 DE19914143476 申请日期 1991.01.25
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO 发明人 AJIKA, NATSUO;ARIMA, HIDEAKI;HACHISUKA, ATSUSHI
分类号 H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L27/108
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