发明名称 |
Ultrasonic transducer slurry dispenser |
摘要 |
The present invention is an ultrasonic transducer slurry dispensing device and method for efficiently distributing slurry. The present invention utilizes ultrasonic energy to facilitate efficient slurry application in a IC wafer fabrication process to permits reduced manufacturing times and slurry consumption during IC wafer fabrication. In one embodiment a chemical mechanical polishing (CMP) ultrasonic transducer slurry dispenser device includes a slurry dispensing slot, a slurry chamber coupled and an ultrasonic transducer. The slurry chamber receives the slurry and transports it to the slurry dispensing slots that apply slurry to a polishing pad. The ultrasonic transducer transmits ultrasonic energy to the slurry. The transmitted ultrasonic energy permits an ultrasonic transducer slurry dispensing device and method of the present invention to achieve a relatively consistent removal rate and a smoother polished wafer surface by facilitating particle disbursement, polishing pad conditioning and uniform slurry distribution.
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申请公布号 |
US6196900(B1) |
申请公布日期 |
2001.03.06 |
申请号 |
US19990390455 |
申请日期 |
1999.09.07 |
申请人 |
VLSI TECHNOLOGY, INC. |
发明人 |
ZHANG LIMING;DUNTON SAMUEL VANCE;WELING MILIND GANESH |
分类号 |
B24B1/04;B24B41/06;B24B53/007;B24B57/02;H01L21/304;(IPC1-7):B24B1/00 |
主分类号 |
B24B1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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