发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
An object of the invention is to provide a resistor element whose contact area is self-alignedly formed to reduce the contact area size and contact resistance variation and which can be formed finely and with high precision at low cost. A thin metal film is deposited on a substrate surface covered with an insulation film on which wirings are formed. The thin metal film is anisotropically etched to leave a desired portion such that the desired portion straddles between wirings, self-alignedly connecting the thin metal film to be a resistor and the wirings.
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申请公布号 |
US2008217740(A1) |
申请公布日期 |
2008.09.11 |
申请号 |
US20080017438 |
申请日期 |
2008.01.22 |
申请人 |
SHIRAMIZU NOBUHIRO;SHIMAMOTO HIROMI |
发明人 |
SHIRAMIZU NOBUHIRO;SHIMAMOTO HIROMI |
分类号 |
H01L27/06;H01L21/02 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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