发明名称 THIN FILM FORMING DEVICE AND FORMATION OF THIN FILM
摘要 PROBLEM TO BE SOLVED: To form a thin film uniformly by controlling liquid level fall velocity for forming a lubricant thin film in an information record medium whose surface is coated with a lubricating film. SOLUTION: In this device, a substrate 4 to be coated is dipped into a solution in which a coating material is dissolved and then dried, making the coating material a thin film on the substrate to be coated. This device is provided with a coating treatment tank 1 for forming a thin film on the substrate 4 to be coated from the coating material, a feed tank 2 for supplying the solution to the coating treatment tank 1, feed piping 10 for supplying the solution from the feed tank 2 to the coating treatment tank 1, and return piping 9 for returning the solution from the coating treatment tank 1 to the feed tank 2. The liquid fall velocity of the solution in the coating treatment tank 1 after dipping the substrate 4 to be coated in the solution is kept at a predetermined fixed fall velocity, and the temperature of the solution during the thin film formation is kept at a predetermined temperature. And, at least the coating treatment tank is closed and filled with an inert gas, thereby keeping the inside of the coating treatment tank at a positive pressure.
申请公布号 JP2001058149(A) 申请公布日期 2001.03.06
申请号 JP19990236002 申请日期 1999.08.23
申请人 HITACHI LTD;TOYO KIKO KK 发明人 MATSUMOTO HIROYUKI;FUNAMOTO SUSUMU;OZAKI MICHINORI;MATSUDO RYUICHI;ISHIHARA HEIGO;KATO AKIRA;MACHIDA SHUNICHIRO
分类号 B05D1/18;B05C3/09;B05C11/10;G11B5/84;(IPC1-7):B05C3/09 主分类号 B05D1/18
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