| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a secondary ion mass analyzing method capable of analyzing a very small amt. of a component in a minute region. SOLUTION: In a focused ion beam/oxygen ion beam alternate irradiation method of one technique of a secondary ion mass analyzing method, a sputtering speed is made slow by lowering the irradiation current of focused ion beam to enable the analysis of a very small amt. of a component in a minute region, the sputtering due to oxygen ions is suppressed by using oxygen ion beam of low energy, and the analyzing vol. due to the focused ion beam is increased to enable the analysis of a very small amt. of the component in the minute region with further high sensitivity.</p> |
