发明名称 Full additive process with filled plated through holes
摘要 A method provides for additive plating on a subcomposite having filled plated through holes. Fine-line circuitry is achieved via electroless deposition onto a dielectric substrate after the through hole is plated and filled. Fine-line circuitry may be routed over landless, plated through holes thereby increasing the aspect ratio and the available surface area for additional components and wiring.
申请公布号 US6195883(B1) 申请公布日期 2001.03.06
申请号 US19980047984 申请日期 1998.03.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BHATT ANILKUMAR C.;MARKOVICH VOYA R.;MEMIS IRVING;WILSON WILLIAM E.
分类号 B32B7/04;H01R12/04;H01R12/06;H05K1/03;H05K1/11;H05K3/00;H05K3/04;H05K3/18;H05K3/40;H05K3/42;H05K3/46;(IPC1-7):H01K3/10 主分类号 B32B7/04
代理机构 代理人
主权项
地址