发明名称 PRETREATMENT DEVICE FOR GAS ANALYZER
摘要 PROBLEM TO BE SOLVED: To surely remove impurity over a long period of time by providing a notch-like peripheral face opening recessed upward from the peripheral edge of a lower end opening on the lower end of a bubbler nozzle, and widening it toward the end with the steepled top. SOLUTION: A circular pipe whose both upper and lower ends are open is used on a first bubbler nozzle 16 inserted by penetrating the upper wall of an upper stage bubbler tank 13 and a second bubbler nozzle 17 extending by inserting the bottom wall of the upper stage bubbler tank. The lower end of the first bubbler nozzle 16 is formed serrated by disposing a triangle in the circumferential direction, a part of the peripheral edge of an end face opening 16a is made a bottom side, and a peripheral face opening 16b recessed upward on a triangular shape, for instance, joins four pieces in the circumferential direction. The lower end side of the second bubbler nozzle 17 is the same. Thereby sample gas becomes fine bubbles, impurity is surely removed, and deposition and adhesion to the inner face of the edge of the peripheral face opening 16b of the separated impurity can be suppressed.
申请公布号 JP2001059802(A) 申请公布日期 2001.03.06
申请号 JP19990234960 申请日期 1999.08.23
申请人 DAICEL CHEM IND LTD 发明人 TARUMA TSUNEO;MAJIMA KOICHI
分类号 G01N1/22;G01N27/74;(IPC1-7):G01N1/22 主分类号 G01N1/22
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