发明名称 Photosensitive composition containing a cyclic dione polymer
摘要 The present invention provides a cyclic dione polymer, which is a homopolymer or a copolymer of a cyclic dione monomer selected from those represented by formulae (I) and (II)whereinA and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group;C is selected from the group consisting of oxygen, sulfur,wherein each R1 is independently selected from C1-20 alkyl and phenyl.
申请公布号 US6197476(B1) 申请公布日期 2001.03.06
申请号 US19980213943 申请日期 1998.12.17
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION 发明人 CHANG SHENG-YUEH;HO BANG-CHEIN;CHEN JIAN-HONG;LIU TING-CHUN;LIN TZU-YU
分类号 C08F22/00;C08F32/00;C08F32/08;C08F34/00;C08F34/02;C08F34/04;C08L45/00;C09D4/00;C09D145/00;G03F7/039;(IPC1-7):G03C1/76 主分类号 C08F22/00
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