| 摘要 |
PROBLEM TO BE SOLVED: To provide a heating apparatus for plasma apparatus in which the problems of the workability, weight and manufacturing cost are solved. SOLUTION: This heating apparatus for plasma treatment apparatus heats two substrates in it, when a generated plasma decomposes a reactive gas to form a film on the substrate or to etch it. It has a bottomed rectangular cylindrical container cover 9, a heater element 7 hosed in the container cover and a lid cover 11 welded so as to close the opening of the container cover and comprises two one-side heat type heaters 8, having heating surfaces at the container cover and a holder 15 for holding the two heaters 8 opposed accross a space in-between for their heating surfaces 13 to face outward and the non- heating surfaces to face inward. |
