| 摘要 |
A heating apparatus has first through fifth heating furnace arranged along the feeding direction in which glass substrates are fed by a feeding mechanism. The first heating furnace has a first heater for heating a glass substrate to at least a target temperature required for processing the workpiece. The second heating furnace has a heater for heating a glass substrate to a temperature equal to or below the target temperature. The second heating furnace generates an amount of heat smaller than that of the first heating furnace.
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