发明名称 APPARATUS FOR SEPARATING CLEANING WATER OF CHEMICAL MECHANICAL POLISHING EQUIPMENT
摘要 PURPOSE: An apparatus for separating cleaning water of a chemical mechanical polishing(CMP) equipment is provided to save deionized pure water and money, by dividing water drained after a cleaning process into pure water and waste water for recycling. CONSTITUTION: A conduit A is installed between a water collecting tank(2) and a waste-water treatment place(1). A conduit B is installed between the conduit A and a polisher(4). The first detecting sensor(6) for detecting a purity of water exhausted from the polisher is installed on the conduit B. A three directional valve is installed between the conduits A and B. The water collecting tank and a pond for a reclaim are connected by a conduit C having a pump(10) and a valve(11). A valve C(13), a filter(14), an ion exchanger(15), a valve D and a conduit D having a valve E are installed between the conduit C and a deionized water inflow hole. A conduit E(18) is connected between the conduit D and the polisher wherein the conduit D is between the valve D(16) and the valve E(17).
申请公布号 KR20010016587(A) 申请公布日期 2001.03.05
申请号 KR20000081402 申请日期 2000.12.23
申请人 A.S.T CO., LTD. 发明人 PARK, GYEONG HO
分类号 H01L21/302;(IPC1-7):H01L21/302 主分类号 H01L21/302
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