发明名称 POWER INTEGRATED CIRCUIT STRUCTURE WHICH IS EASILY MANUFACTURED AND WHOSE CHARACTERISTIC IS EASILY CONTROLLED
摘要 PURPOSE: A power integrated circuit structure which is easily manufactured and whose characteristic is easily controlled is provided to simplify a manufacturing process, by mixing a lateral double-diffused metal oxide semiconductor(LDMOS) transistor of a non reduced-surface(RESURF) type and an LDMOS transistor of a non-RESURF type. CONSTITUTION: A power integrated circuit includes a lateral double-diffused metal oxide semiconductor(LDMOS) transistor of the first conductivity type, an LDMOS transistor of the second conductivity type and a complementary metal oxide semiconductor(CMOS) transistor which are supplied on an active silicon layer of a silicon-on-insulator(SOI) substrate. The LDMOS transistor of the first conductivity type is formed in the deep second conductive well of the active silicon layer as a reduced-surface (RESURF) field type. The LDMOS transistor of the second conductivity type is formed in the deep second conductive well of the active silicon layer as a non-RESURF field type.
申请公布号 KR20010017802(A) 申请公布日期 2001.03.05
申请号 KR19990033494 申请日期 1999.08.14
申请人 KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KOO, JIN GEUN;LEE, DAE U;NAM, GI SU;NOH, TAE MUN
分类号 H01L27/08;(IPC1-7):H01L27/08 主分类号 H01L27/08
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