发明名称 |
POWER INTEGRATED CIRCUIT STRUCTURE WHICH IS EASILY MANUFACTURED AND WHOSE CHARACTERISTIC IS EASILY CONTROLLED |
摘要 |
PURPOSE: A power integrated circuit structure which is easily manufactured and whose characteristic is easily controlled is provided to simplify a manufacturing process, by mixing a lateral double-diffused metal oxide semiconductor(LDMOS) transistor of a non reduced-surface(RESURF) type and an LDMOS transistor of a non-RESURF type. CONSTITUTION: A power integrated circuit includes a lateral double-diffused metal oxide semiconductor(LDMOS) transistor of the first conductivity type, an LDMOS transistor of the second conductivity type and a complementary metal oxide semiconductor(CMOS) transistor which are supplied on an active silicon layer of a silicon-on-insulator(SOI) substrate. The LDMOS transistor of the first conductivity type is formed in the deep second conductive well of the active silicon layer as a reduced-surface (RESURF) field type. The LDMOS transistor of the second conductivity type is formed in the deep second conductive well of the active silicon layer as a non-RESURF field type.
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申请公布号 |
KR20010017802(A) |
申请公布日期 |
2001.03.05 |
申请号 |
KR19990033494 |
申请日期 |
1999.08.14 |
申请人 |
KOREA ELECTRONICS & TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KOO, JIN GEUN;LEE, DAE U;NAM, GI SU;NOH, TAE MUN |
分类号 |
H01L27/08;(IPC1-7):H01L27/08 |
主分类号 |
H01L27/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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